所有产品

Q系列溅射系统
Q Series PVD
产品说明 · Product Description
The all new Q Series range of platforms are based on our proven QPrep system technology offering UHV performance for PVD researchers utalising a conflat flange chamber.  This allows true UHV to be achieved while allowing excellent chamber access through the large top-flange.The Q500 range all use the same proven technology whilst offering optimised characteristics depending on research specialisation and budget.
All joints are internally welded to reduce to an absolute minimum any outgassing. Depending on specification the chamber includes a wide aray of in-situ analysis ports, such as ellipsometry, RGA and differentially pumped RHEED.Base ports are confocal as standard allowing a wider variety and number of deposition sources to be employed than with non-confocal arrangements.The Q500-FLEX has been specifically designed to incorporate our proprietary Nanoparticle source, alongside a wide range of primary PVD sources.
The system can be equipped with turbo pumps ranging from 400 to 1500ls-1 and alternative pump types such as cryopumps may be requested.
Applications
  • Magnetic materials
  • Semiconductor films
  • Dielectric materials
  • Nanostructured films
  • Catalytic materials
  • Device metallisation
分享到:
产品介绍 · Product Introduction
真空度
产品类别
产品重量
超高真空
PVD溅射系统
400.0kg