The IOG 30D is a high-brightness focused ion beam system for contaminant free micro-machining or analysis of small areas. It uses a duoplasmatron ion source and two-lens optical column to produce a high-brightness, low-aberration spot. The source may run on pure argon (or other noble gases), nitrogen, or oxygen, and a mass filter is included in the column to separate beams of different mass/charge species. A selection of 5 apertures allows a wide current range. A gate valve in the column allows the source to be serviced without venting of the whole column.

30 kV High-Brightness Duoplasmatron Source
500 nA Maximum Current
500 nm Spot Size
Integrated Mass Filter
Runs on Ar, Ne, He, Kr, O2, & N2

商品编号: IOG 30D-0001  分类:,  

Installation Requirements

The IOG 30D is designed for retrofitting to vacuum chambers of electron microscopes or SIMS instruments. It mounts via an NW63CF flange, either directly onto an instrument CF flange with clearance boltholes, or via a spacer to adapt to an O-ring flange. The column includes a 2° bend to reject any neutrals in the beam. So, the lower column projects into the instrument chamber off centre by ~6 mm, and angles towards the port axis such that it intersects the sample on the centreline.
The flange to end of column distance can be adapted at the time of manufacture, and can be set between 188 mm and 210 mm. The distance from the end of the column to the sample should ideally be between 18 and 25 mm.
The upper chamber of the ion column requires differential pumping, ideally via a 60 ls-1 turbo pump.
The gas supply must be a high purity (99.999%) with low water content for good performance. This is to be connected to a 6 mm stainless steel tube at the source. Noble gases can be switched off when not in use, Oxygen should be run continuously.


The IOG 30D includes a 6U high voltage power supply for installation in a standard 19 inch rack. This provides the arc supply for the Duoplasmatron and all high voltage and static deflector supplies for the column.
Control is via a software interface, provided on cd for pc installation.
A suitable beam scanning system should be connected to the column. A system for secondary electron detection and imaging is also needed. Ionoptika offers these or we can advise on connections for alternative systems.
SED imaging with 30 keV helium beam, 50pA, achieving 100 nm spatial resolution
Figure 1. SED imaging with 30 keV helium beam, 50pA, achieving 100 nm spatial resolution. Image courtesy of National Institute for Materials Science, Japan.

Beam Energy Range:5 to 30 keV
Source Lifetime:> 400 hrs
Beam Stability:< ±2% / hour after 2 hour warm up
Max. Beam Current (Ar  @ 30 KV):> 500 nA
Min. Spot Size (Ar  @ 30 KV):< 300 nm
Mass filter:Yes
Column Isolation Valve:Yes