The all new M Series range of platforms are based on our proven MBE system technology offering a very low and stable UHV performance for MBE researchers utilising a conflat flange platform. The M Series range regardless of size and complexity use the same proven technology whilst offering optimised characteristics depending on research specialisation and budget.
All joints are internally welded to reduce to an absolute minimum any outgassing.Depending on specification the chamber includes a wide array of in-situ analysis ports, such as ellipsometry, RGA and RHEED. Base ports are confocal as standard allowing a wider variety and number of deposition sources to be employed for best possible thickness uniformity. The M500-FLEX has been specifically designed to incorporate a multipocket UHV E-beam source, alongside a wide range of primary Kcell and atom sourcesApplications
- Semiconductor films
- Oxides/Nitrides
- Nanostructured films
- Chalcogenides
- Compound semiconductors
- Ultra-thin films
- New materials
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