Rapid, scalable device fabrication
Many orders of magnitude faster than SPM techniques, Q-OneTM can generate an array of millions of accurately positioned atoms in just a fraction of a second.
Nanometre precision
Featuring a 20 nm focused ion beam and piezo-driven stage with 1 nm optical encoders, the Q-OneTM provides the ultimate in precision ion placement.
Implant broad range of elements
The liquid metal ion source and mass-filtered column is capable of selecting and implanting more than 40 different elements. A duoplasmatron source is also available for oxygen and nitrogen doping.
Dual Beam
A high-resolution electron column provides detailed imaging down to 4 nm for in-situ verification and process control.
Applications
- Single Ion Implantation
- Quantum Device Fabrication & Research
- Nanomaterial Engineering
- Photonic systems
- Memory Devices
Installations
SIMPLE
Ionoptika Ltd installed the first two instrument of its kind at the Surrey Ion Beam Centre in 2018, as part of the Single Ion Multi-species Positioning at Low Energy (SIMPLE) project. Read more about this exciting project here.
P-NAME
Ionoptika Ltd is delighted that our Q-One system features at the heart of the new PLATFORM FOR NANOSCALE ADVANCED MATERIALS ENGINEERING (P-NAME) at the Henry Royce Institute, Manchester.
| Deterministic single ion implantation |
| 25 kV liquid metal ion source |
| 20 nm ion column |
| Implant a wide range of elements |
| Nanometre-precision stage |
| High-resolution electron column |
| 6-inch wafer handling with load-lock |
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