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Nanosys Series

Key Features
  • Flexible R&D nanoparticle deposition system
  • Variable energy deposition
  • Compound and core-shell nanoparticle generation
  • Nanoparticle size variation +/- 5% (flow/power dependent)

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The Nanosys500 system offers true UHV integrity combined with features crucial to allow the user to explore full potential of nanoparticle deposition.
The main chamber is of a spherical construction with all ports axes passing through the centre-point. The chamber has internal welds and is polished to minimise outgassing. Numerous ports are provided for deposition components, with emphasis on below-horizontal alignment to accommodate instruments which use crucibles to contain evaporant, such as effusion cells. The chamber can optionally be equipped with removable cross-contamination shielding in applications where high rates of deposition are required.
Chamber configuration Sample loading In the basic system, sample entry can be made through a quick-load hinged door (o-ring sealed). For true UHV applications it is necessary to use a sample entry loadlock. Our load-lock uses a magnetically coupled linear/rotary transfer arm to transport samples to the main chamber. Optionally, a sample holder carousel can be included to allow multiple samples to be loaded in the load-lock chamber.